Temperature controlled reaction chamber
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United States of America Patent
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Oct 22, 2024
Grant Date -
Sep 22, 2022
app pub date -
Mar 17, 2022
filing date -
Mar 22, 2021
priority date (Note) -
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Abstract
Apparatuses for processing substrates with temperature controlled reaction chambers are provided. In some embodiments, an apparatus for processing a substrate includes a reaction chamber provided with a chamber wall; a gate valve provided to the wall; a substrate transfer chamber operationally connected to the gate valve; a substrate transfer robot disposed within the substrate transfer chamber for transferring the substrate between the reaction chamber and the substrate transfer chamber through the gate valve; a substrate support provided with a heater disposed within the reaction chamber; and a chiller provided to the wall opposite the gate valve.
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