Substrate with film for reflective mask blank, reflective mask blank, and method for manufacturing reflective mask

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United States of America Patent

PATENT NO 12124162
APP PUB NO 20230104571A1
SERIAL NO

17942257

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Abstract

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A substrate with a film for a reflective mask blank including a substrate, a multilayer reflection film and a back surface conductive film having a composition at the side in contact with the substrate and a different composition at the side remotest from the substrate is provided. The composition at the side in contact with the substrate contains silicon and nitrogen, as main components, and the different composition at the side remotest from the substrate contains tantalum, as a main component, and at least one element selected from the group consisting of silicon, germanium and aluminum.

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Patent Owner(s)

Patent OwnerAddress
SHIN-ETSU CHEMICAL CO LTDTOKYO TOKYO METROPOLIS

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kosaka, Takuro Joetsu, JP 52 118
Ogose, Taiga Joetsu, JP 9 1

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