Thin film material and manufacturing method of thin film material

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United States of America Patent

PATENT NO 12122888
APP PUB NO 20210189077A1
SERIAL NO

16971372

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Abstract

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The present disclosure provides a thin film material and a manufacturing method thereof. The manufacturing method of the thin film material comprises: a compound A and a first reactant reacting to form a compound B; the compound B and a second reactant reacting to form a compound C; the compound C and a third reactant reacting to form a polymer D; the polymer D reacting to obtain a mixture including a polymer F or a polymer H; and a solution including the polymer F or the polymer H forming the polymer F or the polymer H on a substrate.

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Patent Owner(s)

  • WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Wang, Yamin Hubei, CN 73 415

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