Method for producing radiation-sensitive resin composition

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United States of America Patent

PATENT NO 12122883
SERIAL NO

17534397

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Abstract

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A method for producing a radiation-sensitive resin composition includes a step 1 of putting at least a resin having a polarity that increases by an action of an acid, a photoacid generator, and a solvent into a stirring tank, and a step 2 of producing a radiation-sensitive resin composition by stirring and mixing the resin having a polarity that increases by the action of an acid, the photoacid generator, and the solvent in the stirring tank under a gas having an inert gas concentration of 90% by volume or more, in which in the step 2, an atmospheric pressure inside the stirring tank is higher than an atmospheric pressure outside the stirring tank, and in the step 2, a difference between the atmospheric pressure inside the stirring tank and the atmospheric pressure outside the stirring tank is 2.0 kPa or less.

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Patent Owner(s)

Patent OwnerAddress
FUJIFILM CORPORATIONTOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ezoe, Hiroyuki Shizuoka, JP 2 1
Harada, Kenichi Shizuoka, JP 71 466
Tanaka, Takumi Shizuoka, JP 70 250

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