EUV lithography apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Oct 15, 2024
Grant Date -
Jul 6, 2023
app pub date -
Mar 13, 2023
filing date -
Aug 27, 2021
priority date (Note) -
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status (Latency Note)
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Abstract
An extreme ultra violet (EUV) light source apparatus includes a metal droplet generator, a collector mirror, an excitation laser inlet port for receiving an excitation laser, a first mirror configured to reflect the excitation laser that passes through a zone of excitation, and a second mirror configured to reflect the excitation laser reflected by the first mirror.
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International Classification(s)
- 2023 Application Filing Year
- G21K Class
- 107 Applications Filed
- 33 Patents Issued To-Date
- 30.85 % Issued To-Date
Cited Art Landscape
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- 0 Citation Count
- G21K Class
- 0 % this patent is cited more than
- 1 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 3.5 Year Payment | $1600.00 | $800.00 | $400.00 | Apr 15, 2028 |
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Apr 15, 2032 |
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