Metrology method and device for determining a complex-valued field

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United States of America Patent

PATENT NO 12117734
APP PUB NO 20220299886A1
SERIAL NO

17638975

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Abstract

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Disclosed is a method of measuring a structure, and associated metrology device and computer program. The method comprises obtaining an amplitude profile of scattered radiation relating to a measurement of a first structure on a first substrate and obtaining a reference phase profile relating to a reference measurement of at least one reference structure on a reference substrate. The at least one reference structure is not the same structure as said first structure but is nominally identical in terms of at least a plurality of key parameters. The method further comprises determining a complex-valued field to describe the first structure from the amplitude profile and reference phase profile.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Konijnenberg, Alexander Prasetya Veldhoven, NL 7 8
Pandey, Nitesh Silicon Valley, CA 63 188

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