Image stabilization for digital lithography
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United States of America Patent
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Oct 15, 2024
Grant Date -
May 18, 2023
app pub date -
Apr 29, 2020
filing date -
Apr 29, 2020
priority date (Note) -
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Abstract
The present disclosure provides methods and systems for correcting the shooting of images from a spatial light modulator (SLM) to a substrate, when cross-scan vibrations, including sub-pixel cross-scan vibrations, are present. The methods and systems include shifting a mask pattern on an SLM rotated relative to the in-scan direction of travel on a substrate, shifting along an axis of the SLM to correct for cross-scan vibrations, and either delaying, or accelerating, the shooting of the mask pattern onto the substrate.
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