Atomic layer deposition reactor arrangement and a method for operating an atomic layer deposition reactor arrangement

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United States of America Patent

PATENT NO 12116668
APP PUB NO 20240043998A1
SERIAL NO

18475291

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An atomic layer deposition reactor and a method for operating a reactor. The reactor includes a vacuum chamber having a loading wall provided with a loading opening, and a reactor door assembly having a reactor door. The reactor door assembly is arranged to move the reactor door between a first door position in which the reactor door is against the loading wall and arranged to close the loading opening, and a second door position in which the reactor door is spaced apart from and opposite the loading wall. The reactor door assembly is further arranged to move the reactor door between the second door position, and a third door position in which the reactor door is aside from the loading opening.

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Patent Owner(s)

Patent OwnerAddress
BENEQ OYOLARINLUOMA 9 ESPOO 02200

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Andersson, Jonas Espoo, FI 65 1485
Soininen, Pekka Espoo, FI 69 3092
Wesslin, Johannes Espoo, FI 7 0

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