Substrate, method for manufacturing substrate, and electronic device

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United States of America Patent

PATENT NO 12114433
APP PUB NO 20220312595A1
SERIAL NO

17635756

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Abstract

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A substrate that enables increasing an allowable current value of a current path in a thickness direction of the substrate and narrowing spaces between multiple current paths, and the like are provided. To solve this subject, a substrate includes a sheet-shaped first base material (1) having a penetrating hole (1B) in the thickness direction and includes a second base material (2) fitted into the penetrating hole (1B). The second base material (2) includes multiple metal bodies (2B). The metal bodies (2B) penetrate in the thickness direction of the first base material (1) in a state of having an end exposed at each of a first surface and a second surface of the second base material (2) that face each other in the thickness direction.

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Patent Owner(s)

Patent OwnerAddress
FICT LIMITED36 OAZA KITAOWARIBE NAGANO-SHI NAGANO 3818501 ?3818501

International Classification(s)

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  • 2020 Application Filing Year
  • H01L Class
  • 29783 Applications Filed
  • 21134 Patents Issued To-Date
  • 70.96 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances2020202120222023202420250255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Nakano, Hiroshi Nagano, JP 377 4094
Ozaki, Norikazu Nagano, JP 37 268

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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges3335716251501 - 1011 - 20020004000600080001000012000140001600018000200002200024000260002800030000320003400036000

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