Dual source injector with switchable analyzing magnet
Number of patents in Portfolio can not be more than 2000
United States of America
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Oct 8, 2024
Grant Date -
N/A
app pub date -
Oct 4, 2023
filing date -
Oct 4, 2023
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An ion implantation system has a mass analyzing magnet having interior and exterior region and defining a first entrance, second entrance, and an exit. A first ion source defines a first ion beam directed toward the first entrance along a first beam path. A second ion source defines a second ion beam directed toward the second entrance along a second beam path. A magnet current source supplies a magnet current to the mass analyzing magnet. Magnet control circuitry controls a polarity of the magnet current based on a formation of the first or second ion beam. The mass analyzing magnet mass analyzes the respective first or second ion beam to define defining a mass analyzed ion beam along a mass analyzed beam path. At least one shield in the interior or exterior region prevents line-of-sight between the first and second ion sources. Beamline components modify the mass analyzed ion beam.
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International Classification(s)
- 2023 Application Filing Year
- H01J Class
- 1721 Applications Filed
- 298 Patents Issued To-Date
- 17.32 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- H01J Class
- 0 % this patent is cited more than
- 1 Age
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