Substrate treatment device
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Oct 8, 2024
Grant Date -
Oct 21, 2021
app pub date -
Apr 14, 2021
filing date -
Apr 15, 2020
priority date (Note) -
In Force
status (Latency Note)
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Importance

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Non-US Coverage
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Abstract
According to one embodiment, a substrate treatment device includes a placement stand configured to rotate the substrate, a cooling part configured to supply a cooling gas into a space between the placement stand and the substrate, a first liquid supplier configured to supply a first liquid on a surface of the substrate, a second liquid supplier configured to supply a second liquid on the surface, and a controller controlling rotation of the substrate, supply of the cooling gas, the first and second liquids. The controller performs a preliminary process of supplying the second liquid on the surface, and supplying the cooling gas into the space, a liquid film forming process by supplying the first liquid toward the surface after the preliminary process, a supercooling process of the liquid film on the surface, and a freezing process of at least a part of the liquid film on the surface.
First Claim
all claims..Other Claims data not available
Family

- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
SHIBAURA MECHATRONICS CORPORATION | 5-1 KASAMA 2-CHOME SAKAE-KU YOKOHAMA-SHI KANAGAWA |
International Classification(s)

- 2021 Application Filing Year
- H01L Class
- 28775 Applications Filed
- 15216 Patents Issued To-Date
- 52.88 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Demura, Kensuke | Yokohama, JP | 25 | 41 |
# of filed Patents : 25 Total Citations : 41 | |||
Kamiya, Masaya | Yokohama, JP | 11 | 18 |
# of filed Patents : 11 Total Citations : 18 | |||
Matsushima, Daisuke | Yokohama, JP | 18 | 52 |
# of filed Patents : 18 Total Citations : 52 | |||
Nakamura, Minami | Yokohama, JP | 5 | 1 |
# of filed Patents : 5 Total Citations : 1 | |||
Nakamura, Satoshi | Yokohama, JP | 476 | 4052 |
# of filed Patents : 476 Total Citations : 4052 |
Cited Art Landscape
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Patent Citation Ranking
- 0 Citation Count
- H01L Class
- 0 % this patent is cited more than
- 1 Age
Forward Cite Landscape
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Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
---|---|---|---|---|
3.5 Year Payment | $1600.00 | $800.00 | $400.00 | Apr 8, 2028 |
7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Apr 8, 2032 |
11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Apr 8, 2036 |
Fee | Large entity fee | small entity fee | micro entity fee |
---|---|---|---|
Surcharge - 3.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
Surcharge - 7.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
Surcharge - 11.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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