Substrate with multilayer reflective film, reflective mask blank, reflective mask, and method for manufacturing semiconductor device

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United States of America Patent

PATENT NO 12105411
APP PUB NO 20220269161A1
SERIAL NO

17626330

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Abstract

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Provided is a substrate with a thin film for manufacturing a reflective mask that at least does not adversely affect performance of the reflective mask even when a thin film of a substrate with the thin film such as a reflective mask blank comprises impurities.

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Patent Owner(s)

Patent OwnerAddress
HOYA CORPORATIONTOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chaen, Kayo Tokyo, JP 1 1
Suzuki, Kota Tokyo, JP 48 580

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