Method for the analytical measurement of sample material on a sample support
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United States of America Patent
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Oct 1, 2024
Grant Date -
Dec 15, 2022
app pub date -
May 9, 2022
filing date -
May 9, 2022
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Abstract
Disclosed is a method for analytically measuring sample material deposited on a sample support surface, comprising: (a) defining a plurality of regions on the surface, several of which are in contact with sample material, (b1) sampling sections of sample on a region using a desorbing beam to generate desorbed molecules, which are ionized and transferred to an analyzer, (b2) in so doing, sweeping the region by changing an orientation setting of the beam relative to the surface along a non-rectilinear trajectory on the region selected from a plurality of predefined, non-rectilinear trajectories while keeping the support in one position, (c) transitioning from a swept region to a region to be swept next using spatial adjustment of the support, and (d) repeating steps (b1), (b2), and (c) until a predetermined termination condition is fulfilled. A system for analyzing ions, having an ion generation device and a control unit is also disclosed.
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