Ferroelectric memory structure

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United States of America Patent

PATENT NO 12101941
APP PUB NO 20230137738A1
SERIAL NO

17537519

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Abstract

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A ferroelectric memory structure including a substrate, a ferroelectric capacitor structure, and a switch device is provided. The ferroelectric capacitor structure is disposed on the substrate. The ferroelectric capacitor structure includes at least one first electrode, first dielectric layers, a second electrode, and a ferroelectric material layer. The at least one first electrode and the first dielectric layers are alternately stacked. The second electrode penetrates through the first electrode. The ferroelectric material layer is disposed between the first electrode and the second electrode. The switch device is electrically connected to the ferroelectric capacitor structure.

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Patent Owner(s)

Patent OwnerAddress
POWERCHIP SEMICONDUCTOR MANUFACTURING CORPORATIONNO 18 LI-HSIN RD 1 HSINCHU SCIENCE PARK HSINCHU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Shou-Zen Hsinchu, TW 81 733
Chen, Min-Cheng Hsinchu County, TW 16 34
Liao, Ming-Han Hsinchu, TW 19 39
Yoshida, Hiroshi Hsinchu, TW 860 8854

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