Substrate cleaning method and apparatus

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United States of America Patent

PATENT NO 12100586
APP PUB NO 20220351962A1
SERIAL NO

17755505

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Abstract

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A method for cleaning a substrate with pattern structures comprises the following steps: using gas-liquid atomization to clean a substrate surface (601); using TEBO megasonic to clean the substrate surface (602); and drying the substrate (603). The TEBO megasonic cleaning is used to remove small size particles on the substrate and the gas-liquid atomization cleaning is used to remove large size particles on the substrate. The method enables achieving an effect of cleaning the substrate without or with less device damage. A substrate cleaning apparatus is also provided.

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Patent Owner(s)

Patent OwnerAddress
ACM RESEARCH (SHANGHAI) INCBUILDING 4 NO 1690 CAI LUN ROAD CHINA (SHANGHAI) PILOT FREE TRADE ZONE PUDONG NEW AREA SHANGHAI 201203 201203

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Fuping Shanghai, CN 45 43
Wang, Hui Shanghai, CN 1115 8921
Wang, Wenjun Shanghai, CN 67 121
Yao, Ting Shanghai, CN 70 451
Zhang, Xiaoyan Shanghai, CN 147 1153

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