Resist underlayer film-forming composition including reaction product of acid dianhydride

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 12099303
APP PUB NO 20240118620A1
SERIAL NO

18271383

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A composition for forming a resist underlayer film that enables the formation of a desired resist pattern; and a method for producing a resist pattern and a method for producing a semiconductor device, each of which uses said composition for forming a resist underlayer film. A resist underlayer film-forming composition includes a solvent and a polymer having a unit structure represented by formula (I):

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
NISSAN CHEMICAL CORPORATION5-1 NIHONBASHI 2-CHOME CHUO-KU TOKYO 103-6119

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hirohara, Tomotada Toyama, JP 11 1
Kato, Yuki Toyama, JP 94 925
Tamura, Mamoru Toyama, JP 45 230

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation

Maintenance Fees

Fee Large entity fee small entity fee micro entity fee due date
3.5 Year Payment $1600.00 $800.00 $400.00 Mar 24, 2028
7.5 Year Payment $3600.00 $1800.00 $900.00 Mar 24, 2032
11.5 Year Payment $7400.00 $3700.00 $1850.00 Mar 24, 2036
Fee Large entity fee small entity fee micro entity fee
Surcharge - 3.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge - 7.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge - 11.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge after expiration - Late payment is unavoidable $700.00 $350.00 $175.00
Surcharge after expiration - Late payment is unintentional $1,640.00 $820.00 $410.00