Bipolar esc with balanced RF impedance

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United States of America Patent

PATENT NO 12094748
APP PUB NO 20230054444A1
SERIAL NO

17405929

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Abstract

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Exemplary substrate processing systems may include a chamber body defining a transfer region. The systems may include a lid plate seated on the chamber body. The lid plate may define a plurality of apertures. The systems may include a plurality of lid stacks equal to a number of the plurality of apertures. The systems may include a plurality of substrate support assemblies equal to the number of apertures defined through the lid plate. Each assembly may be disposed in one of the processing regions and may include an electrostatic chuck body defining a substrate support surface that defines a substrate seat. Each assembly may include a heater embedded within the chuck body. Each assembly may include bipolar electrodes between the heater and the substrate support surface. Each assembly may include a conductive mesh embedded within the body between the heater and bipolar electrodes.

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Patent Owner(s)

Patent OwnerAddress
APPLIED MATERIALS INC3050 BOWERS AVENUE SANTA CLARA CA 95054

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dzilno, Dmitry A Sunnyvale, US 41 108
Hammond, Edward P Hillsborough, US 18 912
Li, Jian Fremont, US 1062 5232
Rocha-Alvarez, Juan Carlos San Carlos, US 226 10949
Zhang, Wenhao San Jose, US 139 867

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