Process variability aware adaptive inspection and metrology

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United States of America Patent

PATENT NO 12092965
APP PUB NO 20210255548A1
SERIAL NO

17313135

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Abstract

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A defect prediction method for a device manufacturing process involving processing one or more patterns onto a substrate, the method including: determining values of one or more processing parameters under which the one or more patterns are processed; and determining or predicting, using the values of the one or more processing parameters, an existence, a probability of existence, a characteristic, and/or a combination selected from the foregoing, of a defect resulting from production of the one or more patterns with the device manufacturing process.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B V5500 AH VELDHOVEN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hunsche, Stefan Santa Clara, US 53 1042
Jain, Vivek Kumar Milpitas, US 8 33
Vellanki, Venugopal San Jose, US 11 43

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