Methods for forming extreme ultraviolet mask comprising magnetic material

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United States of America

PATENT NO 12092952
SERIAL NO

17347322

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Abstract

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An extreme ultraviolet mask includes a substrate, a reflective multilayer stack over the substrate, a capping layer over the reflective multilayer stack, a patterned absorber layer over a first portion of the capping layer, and a magnetic layer over a second portion of the capping layer around the first portion.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hsu, Pei-Cheng Hsinchu, TW 111 530
Lee, Hsin-Chang Hsinchu, TW 203 1090
Lien, Ta-Cheng Hsinchu, TW 104 198
Tanady, Kevin Hsinchu, TW 2 0
Wang, Tzu-Yi Hsinchu, TW 10 7

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