Laser reflow method

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United States of America Patent

PATENT NO 12090563
APP PUB NO 20230278124A1
SERIAL NO

18175676

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A laser reflow method includes preparing a workpiece including a board and semiconductor chips each having one or more bumps formed on one surface thereof, the semiconductor chips being placed on the board with the bumps interposed therebetween. An inclination detection step captures an image of one semiconductor chip and detects an inclination of the semiconductor chip within the captured image. A laser beam irradiation step irradiates each semiconductor chip with a laser beam from another surface side opposite to the one surface to reflow the bumps formed within an irradiated range of the workpiece. A phase pattern displayed by a spatial light modulator is rotated in such a manner as to agree with the inclination of the detected semiconductor chip, to thereby rotate an irradiation range of the laser beam within an irradiated surface of the workpiece, before the semiconductor chips are irradiated with the laser beam.

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Patent Owner(s)

Patent OwnerAddress
DISCO CORPORATION13-11 OMORI-KITA 2-CHOME OTA-KU TOKYO 143-8580

International Classification(s)

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  • 2023 Application Filing Year
  • B23K Class
  • 1289 Applications Filed
  • 271 Patents Issued To-Date
  • 21.03 % Issued To-Date

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Mizumoto, Yuta Tokyo, JP 2 0

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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges18354401 - 10010020030040050060070080090010001100120013001400150016001700180019002000

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