Substrate processing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 12087598
APP PUB NO 20180204742A1
SERIAL NO

15919674

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Abstract

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A substrate processing apparatus, includes: a process chamber accommodating a substrate; a vaporizer vaporizing a liquid precursor to generate reaction gas and deliver a processing gas containing the reaction gas and a carrier gas, the vaporizer including: a vaporization vessel; and a heater heating the liquid precursor introduced into the vessel; a carrier gas flow rate controller controlling flow rate of the carrier gas supplied to the vaporizer; a liquid precursor flow rate controller controlling flow rate of the liquid precursor; a processing gas supply pipe introducing the processing gas delivered from the vaporizer into the process chamber; and a gas concentration sensor detecting a gas concentration of the reaction gas contained in the processing gas delivered from the vaporizer into the processing gas supply pipe.

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Patent Owner(s)

Patent OwnerAddress
KOKUSAI ELECTRIC CORPORATION3-4 KANDAKAJI-CHO CHIYODA-KU TOKYO 1010045 ?1010045

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hara, Daisuke Toyama, JP 87 1129
Horii, Sadayoshi Toyama, JP 41 2570
Joda, Takuya Toyama, JP 16 76
Kakuda, Toru Toyama, JP 12 35
Okuno, Masahisa Toyama, JP 13 117
Tanaka, Akinori Toyama, JP 71 830
Tateno, Hideto Toyama, JP 29 478
Tsukamoto, Takashi Toyama, JP 127 1564

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