Particle removing assembly and method of cleaning mask for lithography
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United States of America Patent
Stats
-
Sep 10, 2024
Grant Date -
Oct 5, 2023
app pub date -
May 23, 2023
filing date -
May 23, 2023
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A photolithographic apparatus includes a particle removing cassette, a pump and a compressor. The particle removing cassette includes a first slit that includes an array of parallel wind blade nozzles arranged along a length of the first slit, protruding from the first slit, and configured to eject and direct pressurized cleaning material to a patterning surface of a mask to remove debris particles on the patterning surface. The pump and the compressor are controlled by a controller to adjust a flow rate and a pressure of the pressurized cleaning material based on an amount of debris particles on the patterning surface of the mask.
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