System and method for monitoring and controlling extreme ultraviolet photolithography processes
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United States of America Patent
Stats
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Sep 10, 2024
Grant Date -
Jul 21, 2022
app pub date -
Jan 15, 2021
filing date -
Jan 15, 2021
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become a plasma and emit extreme ultraviolet radiation. An array of sensors sense the extreme ultraviolet radiation and charged particles emitted by the droplets. A control system analyses sensor signals from the sensors and adjusts plasma generation parameters responsive to the sensor signals.
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International Classification(s)
- 2021 Application Filing Year
- G21K Class
- 176 Applications Filed
- 86 Patents Issued To-Date
- 48.87 % Issued To-Date
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- 0 Citation Count
- G21K Class
- 0 % this patent is cited more than
- 1 Age
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