Near-field lithography immersion system, immersion unit and interface module thereof

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United States of America Patent

PATENT NO 12078937
APP PUB NO 20240272558A1
SERIAL NO

18287638

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Abstract

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Provided is an near-field lithography immersion system, including: an immersion unit including: a liquid flow channel and a gas flow channel configured to apply gas to confine an immersion liquid provided by the liquid flow channel into an exposure field; at least two interface modules, the interface module includes a gas connector, a liquid connector and a brake connector, the gas connector and the liquid connector are correspondingly connected to the gas flow channel and the liquid flow channel, respectively, the brake connector is configured to control an assembly and a disassembly of the immersion unit, and the interface module is detachably connected to the immersion unit; and a mask loading module including a mask base plate and a mask, the immersion liquid is guided to an edge of the mask from below the mask base plate to form an immersion field between the mask and a substrate.

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Patent Owner(s)

Patent OwnerAddress
THE INSTITUTE OF OPTICS AND ELECTRONICS THE CHINESE ACADEMY OF SCIENCESP O BOX 350 SHUANGLIU CHENGDU SICHUAN 610209

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Luo, Xiangang Sichuan, CN 119 201
Luo, Yunfei Sichuan, CN 8 8
Pu, Mingbo Sichuan, CN 14 17
Wang, Changtao Sichuan, CN 9 18
Wang, Yanqin Sichuan, CN 15 18
Zhang, Yiyun Sichuan, CN 32 205
Zhao, Chengwei Sichuan, CN 3 8
Zhao, Zeyu Sichuan, CN 16 28

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