Substrate for epitaxial growth and method for producing same

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United States of America Patent

PATENT NO 12070923
APP PUB NO 20230082193A1
SERIAL NO

17984371

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Abstract

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It is an object to provide a substrate for epitaxial growth having a metal base material laminated with a copper layer. On a surface of the copper layer, an area occupied by crystal grains having crystal orientations other than a (200) plane present within 3 μm from the surface can be less than 1.5%. A surface roughness along a same direction as a rolling direction per unit length of 60 μm when measured by AFM can be Ra1<10 nm.

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Patent Owner(s)

Patent OwnerAddress
TOYO KOHAN CO LTD2-18-1 HIGASHI-GOTANDA SHINAGAWA-KU TOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hashimoto, Yusuke Kudamatsu, JP 97 429
Kurokawa, Teppei Kudamatsu, JP 16 31
Okayama, Hironao Kudamatsu, JP 24 91

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