Pellicle and pellicle assembly

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 12066758
APP PUB NO 20220252974A1
SERIAL NO

17728608

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Abstract

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A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.

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Patent Owner(s)

  • ASML NETHERLANDS B.V.; ASML HOLDING N.V

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Abegg, Erik Achilles Eindhoven, NL 8 35
Bendiksen, Aage Fairfield, US 13 131
Brouns, Derk Servatius Gertruda Herentals, BE 22 89
Govil, Pradeep K Norwalk, US 21 204
Janssen, Paul Eindhoven, NL 34 129
Nasalevich, Maxim Aleksandrovich Eindhoven, NL 23 48
Notenboom, Arnoud Willem Rosmalen, NL 28 120
Péter, Mária Eindhoven, NL 23 86
Van, De Kerkhof Marcus Adrianus Helmond, NL 125 1774
Van, Der Zande Willem Joan Bussum, NL 19 100
Van, Zwol Pieter-Jan Eindhoven, NL 33 101
Vermeulen, Johannes Petrus Martinus Bernardus Leende, NL 81 430
Vles, David Ferdinand Eindhoven, NL 29 68
Voorthuijzen, Willem-Pieter 's-Hertogenbosch, NL 17 59
Wiley, James Norman Menlo Park, US 11 64

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