Method for producing radiation-sensitive resin composition and pattern forming method

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 12061415
APP PUB NO 20230099422A1
SERIAL NO

17902202

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Abstract

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A method for producing a composition, the method being for producing a composition using a stirring device provided with a stirring tank and a stirrer, includes a mixing step of charging a resin, an acid generator, and a solvent into the stirring tank, and a stirring step of stirring the mixture accommodated in the stirring tank, using the stirrer, in which a ratio c of a content of the acid generator to a total mass of the mixture is 0.3% to 2.5% by mass, the stirrer is provided with a rotatable stirring shaft, a plurality of support parts attached to the stirring shaft, and a plurality of stirring elements attached to each of end parts of the plurality of support parts, the shape and the arrangement of the stirring elements are specified, and the positions of the plurality of stirring elements are specified so as to satisfy a specific Expression (1).

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Patent Owner(s)

Patent OwnerAddress
FUJIFILM CORPORATIONTOKYO 106-8620

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bannai, Takashi Haibara-gun, JP 7 127
Higashi, Kohei Haibara-gun, JP 30 4598
Kurumisawa, Yuma Haibara-gun, JP 6 1
Tanaka, Takumi Haibara-gun, JP 70 250
Tomiga, Takamitsu Haibara-gun, JP 22 92
Yoshino, Fumihiro Haibara-gun, JP 31 60

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