Semiconductor device fabricated using channeling implant

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United States of America Patent

PATENT NO 12057316
APP PUB NO 20230083106A1
SERIAL NO

17476829

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Abstract

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A method includes orienting a silicon carbide layer to a first crystal channel direction relative to a first ion beam and implanting phosphorous into the silicon carbide layer using the first ion beam to define a first doped region in the silicon carbide layer. A deviation angle between the first crystal channel direction and the first ion beam is less than ±1° and the first crystal channel direction comprises a <0001> direction or a <11-23> direction.

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Patent Owner(s)

Patent OwnerAddress
INFINEON TECHNOLOGIES AG85579 NEUBIBERG

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ellinghaus, Paul Unterhaching, DE 8 9
Jelinek, Moriz Villach, AT 35 166
Koenig, Axel Villach, AT 12 186
Leendertz, Caspar Munich, DE 51 108
Schulze, Hans-Joachim Taufkirchen, DE 693 4306
Schustereder, Werner Villach, AT 66 284

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