Overlay mark design for electron beam overlay

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 12055859
APP PUB NO 20230324810A1
SERIAL NO

18204662

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Abstract

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Electron beam overlay targets and method of performing overlay measurements on a target using a semiconductor metrology tool are provided. One target includes a plurality of electron beam overlay elements and a plurality of two-dimensional elements that provide at least one two-dimensional imaging. The plurality of two dimensional elements are an array of evenly-spaced polygonal gratings across at least three rows and at least three columns. Another target includes a plurality of electron beam overlay elements and a plurality of AIMid elements. Each of the electron beam overlay elements includes at least two gratings that are overlaid at a perpendicular orientation to each other. The plurality of AIMid elements includes at least two gratings that are overlaid at a perpendicular orientation to each other.

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Patent Owner(s)

Patent OwnerAddress
KLA CORPORATIONONE TECHNOLOGY DRIVE MILPITAS CA 95035

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Eyring, Stefan Weilburg, DE 17 65
Feler, Yoel Haifa, IL 43 460
Ghinovker, Mark Yoqneam Ilit, IL 86 1926
Gutman, Nadav Zichron Ya'aqov, IL 31 108
Hajaj, Eitan Ashqelon, IL 12 11
Naot, Ira Milpitas, US 19 170
Pohlmann, Ulrich Jena, DE 11 63
Steely, Chris Yokneam Ilit, IL 6 5
Steely-Tarshish, Inna Yokneam Ilit, IL 6 3
Yohanan, Raviv Qiryat Motzkin, IL 14 74

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