Aluminum alloy member for forming fluoride film and aluminum alloy member having fluoride film
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United States of America Patent
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Aug 6, 2024
Grant Date -
Oct 14, 2021
app pub date -
Apr 19, 2019
filing date -
Jul 4, 2018
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Abstract
Provided is an aluminum alloy member for forming a fluoride film thereon, the fluoride film being excellent in smoothness without occurrence of a black dot-shaped bulged portion and excellent in corrosion resistance against corrosive gas and plasma, etc. The aluminum alloy member for forming a fluoride film thereon 1 for use in a semiconductor producing apparatus consists of Si: 0.3 mass % to 0.8 mass %; Mg: 0.5 mass % to 5.0 mass %; Fe: 0.05 mass % to 0.5 mass %; Cu: 0 mass % or more and 0.5 mass % or less; Mn: 0 mass % or more and 0.30 mass % or less; Cr: 0 mass % or more and 0.30 mass % or less 0.5 mass % or less; and the balance being Al and inevitable impurities. When an average major diameter of a Fe-based crystallized product in the aluminum alloy member is D (μm), and an average crystalline particle diameter in the aluminum alloy member is Y (μm), a relation expression of log10 Y←0.320D+4.60 is satisfied. A fluoride film 2 is formed on at least a part of a surface of the aluminum alloy member 1 for forming a fluoride film thereon.
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