Apparatus and methods for effective impurity gettering

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United States of America

PATENT NO 12046614
SERIAL NO

16998525

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Abstract

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Apparatus and methods for effective impurity gettering are described herein. In some embodiments, a described device includes: a substrate; a pixel region disposed in the substrate; an isolation region disposed in the substrate and within a proximity of the pixel region; and a heterogeneous layer on the seed area. The isolation region comprises a seed area including a first semiconductor material. The heterogeneous layer comprises a second semiconductor material that has a lattice constant different from that of the first semiconductor material.

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Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Chia-Chan Zhubei, TW 37 86
Chen, Pu-Fang Hsinchu, TW 23 38
Huang, Shih-Hsien Hsin-Chu, TW 60 372
Lee, Yueh-Chuan Hsinchu, TW 56 431

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