Reflective mask and fabricating method thereof
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United States of America Patent
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Jul 16, 2024
Grant Date -
Jul 20, 2023
app pub date -
Mar 22, 2023
filing date -
Oct 25, 2018
priority date (Note) -
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Abstract
The prevent disclosure provides a method for forming a reflective mask. In some embodiments, the method includes forming a carbon-containing layer over a substrate; forming a reflective multilayer over the carbon-containing layer; forming an absorption pattern over the reflective multilayer. In some embodiments, the method includes growing a light absorbing layer over a substrate; polishing the light absorbing layer; forming a reflective layer over the polished light absorbing layer; forming an absorption pattern over the reflective layer.
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