Device and method used for measuring wafers

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United States of America

PATENT NO 12033901
SERIAL NO

17290706

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Abstract

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The present disclosure relates to a device and method for measuring wafers. The device comprises: a moving platform, which is used to adjust the location of wafers; a first pre-alignment module and a first image recognition module, which are used to align a first wafer at a first location on the moving platform before measuring the first wafer; a second pre-alignment module and a second image recognition module, which are used to align a second wafer at a second location on the moving platform before measuring the second wafer; and a measurement module, which is used to measure the first wafer and the second wafer at a third location on the moving platform, wherein the first location, second location and third location are different from each other. The embodiments of the present disclosure may improve the measurement efficiency of the device.

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Patent Owner(s)

Patent OwnerAddress
RAINTREE SCIENTIFIC INSTRUMENTS (SHANGHAI CORPORATION)6 BLOG NO 68 HUATUO RD CHINA (SHANGHAI) PILOT FREE TRADE ZONE SHANGHAI 211203

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gao, Haijun Shanghai, CN 9 18
Li, Bin Shanghai, CN 1200 10531

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