Reflective mask blank, reflective mask, and method for manufacturing reflective mask

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United States of America Patent

PATENT NO 12032280
APP PUB NO 20240160097A1
SERIAL NO

18544970

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A reflective mask blank includes: a substrate; a multilayer reflective film configured to reflect EUV light; a protective film; and a phase shift film configured to shift a phase of EUV light, in this order, in which the phase shift film includes a first layer including one or more first elements selected from a group consisting of ruthenium, rhenium, iridium, silver, osmium, gold, palladium, and platinum, and a second layer including one or more second elements selected from a group consisting of tantalum and chromium, the first layer includes a region A1 in which a content of an element having a highest content among the one or more first elements increases in a thickness direction from a side opposite to the second layer toward the second layer, and the region A1 is present adjacent to the second layer.

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Patent Owner(s)

Patent OwnerAddress
AGC INC5-1 MARUNOUCHI 1-CHOME CHIYODA-KU TOKYO 100-8405

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fudetani, Taiga Fukushima, JP 3 0
Hanekawa, Hiroshi Fukushima, JP 24 82
Ono, Yusuke Fukushima, JP 59 169
Taki, Shunya Fukushima, JP 8 4

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