Methods and apparatus for reducing hydrogen permeation from lithographic tool
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United States of America Patent
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Jul 2, 2024
Grant Date -
May 25, 2023
app pub date -
Jan 23, 2023
filing date -
Jun 18, 2021
priority date (Note) -
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Abstract
An apparatus for reducing hydrogen permeation of a mask is provided when generating extreme ultraviolet (EUV) radiation. The apparatus includes a mask stage configured to hold the mask, a hydrogen dispensing nozzle configured to eject hydrogen below the mask, and a trajectory correcting assembly. The trajectory correcting assembly includes a correcting nozzle and a gas flow detector. The correcting nozzle is configured to dispense at least one flow adjusting gas to adjust a trajectory of the hydrogen away from the mask to reduce hydrogen permeation at an edge of the mask. The gas flow detector is configured to measure a variation of an airflow of the hydrogen adjusted by the at least one flow adjusting gas.
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