Resist underlayer film-forming composition that contains triaryldiamine-containing novolac resin to which aromatic vinyl compound is added

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United States of America Patent

PATENT NO 12025916
APP PUB NO 20200387072A1
SERIAL NO

16971357

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Abstract

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A resist underlayer film-forming composition including a novolac resin having a structural group (C) formed by reaction between an aromatic ring of an aromatic compound (A) having at least two amino groups and three C6-40 aromatic rings and a vinyl group of an aromatic vinyl compound (B). The structural group (C) may be a group of the following Formula (1):

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Patent Owner(s)

Patent OwnerAddress
NISSAN CHEMICAL CORPORATION5-1 NIHONBASHI 2-CHOME CHUO-KU TOKYO 1036119

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hashimoto, Keisuke Toyama, JP 136 1174
Karasawa, Ryo Toyama, JP 36 358
Nishimaki, Hirokazu Toyama, JP 40 150
Saito, Daigo Toyama, JP 32 278

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