Structured light projection through the minimization of visual artifacts by way of deliberately introduced optical aberrations
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United States of America Patent
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Jul 2, 2024
Grant Date -
Nov 18, 2021
app pub date -
May 12, 2021
filing date -
May 12, 2020
priority date (Note) -
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Abstract
A triangulation device for measuring a measurement object by a projection of a structured light pattern onto the measurement object. The triangulation device includes a projector projecting the structured light pattern decomposable into different spatial frequencies onto the measurement object. The projector comprises a matrix of pixel elements and a lens system which determines a wavefront with a wavefront aberration from a reference wavefront, and a camera including a lens system and an imaging sensor, the camera being configured to receive the structured light pattern projected by the projector onto the measurement object, and a processing unit configured to provide distance information by evaluating imaging information provided by the camera. The wavefront aberration comprises a primary spherical aberration coefficient Z9, wherein the primary spherical aberration coefficient Z9 is larger than 0.5λ, wherein λ is a wavelength of the projected structured light pattern.
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