Quality prediction method, preparation method and system of high resistance gallium oxide based on deep learning and edge-defined film-fed growth method

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United States of America Patent

PATENT NO 12024791
APP PUB NO 20230160098A1
SERIAL NO

17760964

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Abstract

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A high resistance gallium oxide quality prediction method based on deep learning and an edge-defined film-fed crystal growth method, a preparation method and a system; the quality prediction method includes the following steps: obtaining preparation data of a high resistance gallium oxide single crystal prepared by the edge-defined film-fed crystal growth method, the preparation data including seed crystal data, environment data and control data, and the control data including doping element concentration and doping element type; preprocessing the preparation data to obtain preprocessed preparation data; inputting the preprocessing preparation data into a trained neural network model, acquiring the predicted quality data corresponding to the high resistance gallium oxide single crystal through the trained neural network model, the predicted quality data including predicted resistivity.

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Patent OwnerAddress
HANGZHOU FUJIA GALLIUM TECHNOLOGY CO LTDFUYANG DISTRICT HANGZHOU ZHEJIANG 311400

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Duanyang Hangzhou, CN 12 1
Qi, Hongji Hangzhou, CN 11 1
Sai, Qinglin Hangzhou, CN 5 3

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