Method of preparing metal mask substrate

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United States of America Patent

PATENT NO 12024780
APP PUB NO 20220404695A1
SERIAL NO

17524076

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Abstract

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A method of preparing a metal mask substrate includes providing a metal substrate. Next, a gloss is measured and obtained from the surface of the metal substrate. Next, the gloss is determined whether to be within a predetermined range. When the gloss is determined within the predetermined range, a photolithography process is performed to the metal substrate, where the predetermined range is between 90 GU and 400 GU.

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Patent Owner(s)

Patent OwnerAddress
DARWIN PRECISIONS CORPORATIONNO 20-1 GUANGFU N RD HUKOU TOWNSHIP HSINCHU COUNTY 30351

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lin, Chi-Wei Hsinchu County, TW 47 172
Lin, Wen-Yi Hsinchu County, TW 81 1412

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