Mask blanks and methods for depositing layers on mask blank
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United States of America Patent
Stats
-
Jun 25, 2024
Grant Date -
Apr 20, 2023
app pub date -
Dec 19, 2022
filing date -
Dec 19, 2022
priority date (Note) -
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status (Latency Note)
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Abstract
A reflective mask blank includes a substrate, a reflective multilayer (RML) disposed on the substrate, a capping layer disposed on the reflective multilayer, and an absorber layer disposed on the capping layer. The absorber layer has length or width dimensions smaller than the capping layer, and part of the capping layer is exposed by the absorber layer. The dimension of the absorber layer and the hard mask layer ranges between 146 cm to 148 cm. The dimensions of the substrate, the RML, and the capping layer range between 150 cm to 152 cm.
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