Sequential infiltration synthesis apparatus and a method of forming a patterned structure

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United States of America Patent

PATENT NO 12000042
APP PUB NO 20220389578A1
SERIAL NO

17885810

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Abstract

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A sequential infiltration synthesis apparatus comprising:

    a reaction chamber constructed and arranged to hold at least a first substrate;a precursor distribution and removal system to provide to and remove from the reaction chamber a vaporized first or second precursor; and,a sequence controller operably connected to the precursor distribution and removal system and comprising a memory provided with a program to execute infiltration of an infiltrateable material provided on the substrate when run on the sequence controller by:activating the precursor distribution and removal system to provide and maintain the first precursor for a first period T1 in the reaction chamber;activating the precursor distribution and removal system to remove a portion of the first precursor from the reaction chamber for a second period T2; and,activating the precursor distribution and removal system to provide and maintain the second precursor for a third period T3 in the reaction chamber. The program in the memory is programmed with the first period T1 longer than the second period T2.

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Patent Owner(s)

Patent OwnerAddress
ASM IP HOLDING B VVERSTERKERSTRAAT 8 ALMERE 1322 AP

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
De, Roest David Kurt Kessel-Lo, BE 31 3576
Jongbloed, Bert Oud-Heverlee, BE 58 6646
Kachel, Krzysztof Kamil Heverlee, BE 13 2468
Knaepen, Werner Leuven, BE 45 6955
Maes, Jan Willem Wilrijk, BE 111 19161
Pierreux, Dieter Dilbeek, BE 71 7645

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