Two-dimensional material printer and transfer system and method for atomically layered materials

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United States of America Patent

PATENT NO 11999146
APP PUB NO 20210178738A1
SERIAL NO

17176142

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Abstract

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Precision and chip contamination-free placement of two-dimensional (2D) material and van der Waals (VDW) layered materials accelerates both the study of fundamental properties and novel device functionality. The system transfers 2D materials utilizing a combination of a narrow transfer-stamper and viscoelastic and optically transparent film. Precise placement of individual 2D materials results in vanishing cross-contamination to the substrate. The 2D printer results in an aerial cross-contamination improvement of two to three orders of magnitude relative to state-of-the-art transfer methods from a source of average area sub um{circumflex over ( )}2. The transfer-stamper does not physically harm any micro/nanostructures preexisting on the target substrates receiving the 2D material such as, nanoelectronics, waveguides or micro-ring resonators. Such accurate and substrate-benign transfer method for 2D and VDW layered materials provides rapid device prototyping due to its high time-reduction, accuracy, and contamination-free process.

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Patent Owner(s)

Patent OwnerAddress
THE GEORGE WASHINGTON UNIVERSITYRICE HALL SUITE 601 2121 I STREET NW WASHINGTON DC 20052

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hemnani, Rohit Anil Washington, US 2 3
Sorger, Volker J Alexandria, US 22 122

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