Plasma generating device
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
May 28, 2024
Grant Date -
Jun 15, 2023
app pub date -
Mar 29, 2021
filing date -
Mar 31, 2020
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A plasma generating device includes: a chamber which is equipped with a dielectric wall structure and into which sample gas to be measured flows; an RF supplying mechanism that generates plasma inside the chamber using an electric field and/or a magnetic field through the dielectric wall structure; and a floating potential supplying mechanism that includes a first electrode disposed along an inner surface of the chamber. The RF supplying mechanism may include an RF field forming unit disposed in a first direction with respect to the chamber and the first electrode may include an electrode disposed in a second direction with respect to the chamber.
First Claim
Other Claims data not available
Family
International Classification(s)
- 2021 Application Filing Year
- H01J Class
- 2475 Applications Filed
- 1245 Patents Issued To-Date
- 50.31 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- H01J Class
- 0 % this patent is cited more than
- 1 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 3.5 Year Payment | $1600.00 | $800.00 | $400.00 | Nov 28, 2027 |
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Nov 28, 2031 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Nov 28, 2035 |
