System and method for generating and analyzing roughness measurements and their use for process monitoring and control
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United States of America Patent
Stats
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May 28, 2024
Grant Date -
May 12, 2022
app pub date -
Jan 25, 2022
filing date -
Jan 25, 2022
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
In one embodiment, a method includes receiving measured linescan information describing a pattern structure of a feature, applying the received measured linescan information to an inverse linescan model that relates measured linescan information to feature geometry information, and identifying, based at least in part on the applying the received measured linescan model to the inverse linescan model, feature geometry information that describes a feature that would produce a linescan corresponding to the received measured linescan information. The method also includes determining, at least in part using the inverse linescan model, feature edge positions of the identified feature, analyzing the feature edge positions to determine errors in the manufacture of the pattern structure, and controlling a lithography tool based on the analysis of the feature edge positions.
First Claim
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International Classification(s)
- 2022 Application Filing Year
- H01J Class
- 2261 Applications Filed
- 741 Patents Issued To-Date
- 32.78 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- H01J Class
- 0 % this patent is cited more than
- 1 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 3.5 Year Payment | $1600.00 | $800.00 | $400.00 | Nov 28, 2027 |
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Nov 28, 2031 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Nov 28, 2035 |
