Method and apparatus for filling a gap

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United States of America Patent

PATENT NO 11990333
APP PUB NO 20230335397A1
SERIAL NO

18208398

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Abstract

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There is provided a method of filling one or more gaps by providing the substrate in a reaction chamber and introducing a first reactant to the substrate with a first dose, thereby forming no more than about one monolayer by the first reactant on a first area; introducing a second reactant to the substrate with a second dose, thereby forming no more than about one monolayer by the second reactant on a second area of the surface, wherein the first and the second areas overlap in an overlap area where the first and second reactants react and leave an initially unreacted area where the first and the second areas do not overlap; and, introducing a third reactant to the substrate with a third dose, the third reactant reacting with the first or second reactant remaining on the initially unreacted area.

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Patent Owner(s)

Patent OwnerAddress
ASM IP HOLDING B VVERSTERKERSTRAAT 8 ALMERE 1322 AP

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jongbloed, Bert Oud-Heverlee, BE 58 6646
Knaepen, Werner Leuven, BE 45 6955
Pierreux, Dieter Pepingen, BE 71 7645
Pore, Viljami Helsinki, FI 83 9315
Suzuki, Toshiya Helsinki, FI 147 6629
van, Der Star Gido Leuven, BE 10 1409

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