Slurry distribution device for chemical mechanical polishing

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11986926
APP PUB NO 20220402096A1
SERIAL NO

17897088

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Importance

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Abstract

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An apparatus for chemical mechanical polishing includes a rotatable platen having a surface to support a polishing pad, a carrier head to hold a substrate in contact with the polishing pad, and a polishing liquid distribution system. The polishing liquid distribution system includes a dispenser positioned to deliver a polishing liquid to a portion of a polishing surface of the polishing pad, and a curved barrier positioned after the dispenser to spread fresh polishing liquid from the dispenser.

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Patent Owner(s)

Patent OwnerAddress
APPLIED MATERIALS INC3050 BOWERS AVENUE SANTA CLARA CA 95054

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Butterfield, Paul D San Jose, US 74 772
Chang, Shou-Sung Mountain View, US 112 762
Fisher, Alexander John Santa Clara, US 18 38
Jew, Stephen San Jose, US 23 184
Kim, Bum Jick Irvine, US 11 55
Tang, Jianshe San Jose, US 105 850
Wu, Haosheng San Jose, US 56 135
Yang, Yen-Chu Santa Clara, US 14 45

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