Techniques for combining CMP process tracking data with 3D printed CMP consumables

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United States of America Patent

PATENT NO 11986922
APP PUB NO 20200135517A1
SERIAL NO

16731492

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Abstract

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Chemical mechanical polishing (CMP) apparatus and methods for manufacturing CMP apparatus are provided herein. CMP apparatus may include polishing pads, polishing head retaining rings, and polishing head membranes, among others, and the CMP apparatus may be manufactured via additive manufacturing processes, such as three dimensional (3D) printing processes. The CMP apparatus may include wireless communication apparatus components integrated therein. Methods of manufacturing CMP apparatus include 3D printing wireless communication apparatus into a polishing pad and printing a polishing pad with a recess configured to receive a preformed wireless communication apparatus.

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Patent Owner(s)

Patent OwnerAddress
APPLIED MATERIALS INC3050 BOWERS AVENUE SANTA CLARA CA 95054

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bajaj, Rajeev Fremont, US 162 3380
Cornejo, Mario San Jose, US 9 305
Fung, Jason G Santa Clara, US 28 673
Khanna, Aniruddh Jagdish Fremont, US 6 32
Menk, Gregory E Pleasanton, US 49 864
Redfield, Daniel Morgan Hill, US 65 1172
Watkins, John Los Gatos, US 49 788

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