Simulation method for semiconductor fabrication process and method for manufacturing semiconductor device
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United States of America Patent
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May 14, 2024
Grant Date -
Feb 10, 2022
app pub date -
Apr 14, 2021
filing date -
Apr 14, 2021
priority date (Note) -
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Abstract
According to an aspect of the present inventive concept, a simulation method for a semiconductor fabrication process includes obtaining, as input data, process parameters for controlling a semiconductor process of manufacturing semiconductor devices, or design parameters representing a structure of the semiconductor devices, or both the process parameters and the design parameters; generating predictive data for electrical characteristics of the semiconductor devices using a machine learning model based on the input data; generating reference data for the electrical characteristics of the semiconductor devices using a simulation tool based on the input data; and training the machine learning model using the predictive data and the reference data.
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