Dressing apparatus and polishing apparatus
Number of patents in Portfolio can not be more than 2000
United States of America
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May 14, 2024
Grant Date -
N/A
app pub date -
Jul 9, 2021
filing date -
Jul 9, 2021
priority date (Note) -
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status (Latency Note)
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Abstract
A dressing apparatus includes a dresser provided in a polishing apparatus for polishing a board-like work by relative movement between the work and a polishing pad while bringing the polishing pad into contact with the work, the dresser having a dressing surface that slides relative to a polishing surface of the polishing pad to dress the polishing pad; a dresser drive member that rotates the dresser; a high-pressure water generating device that supplies high-pressure water pressurized to 1 to 15 MPa; and a high-pressure water injection nozzle that injects the high-pressure water toward the dressing surface rotating.
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