Substrate processing system and substrate processing method

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United States of America Patent

PATENT NO 11978644
APP PUB NO 20220392779A1
SERIAL NO

17886687

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Abstract

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A substrate processing system includes: a batch-type processing part that collectively processes a lot including substrates arranged at a first pitch; a single-substrate-type processing part that processes the substrates of the lot one by one; and an interface part that delivers the substrates between the batch-type processing part and the single-substrate-type processing part. The batch-type processing part includes a processing bath that stores a processing solution having a lump shape or a mist shape, a first holder that holds the substrates arranged at the first pitch, and a second holder that receives the substrates arranged at a second pitch from the first holder in the processing solution. The interface part includes a transfer part that transfers the substrates held separately by the first and second holders in the processing solution, from the batch-type processing part to the single-substrate-type processing part.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITED3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 1076325 ?1076325

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kai, Yoshihiro Koshi, JP 57 1111
Kanagawa, Kouzou Koshi, JP 16 44
Onzuka, Keiji Koshi, JP 8 10
Tsurusaki, Kotaro Koshi, JP 15 125

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